THE VISION: Enabling direct-write lithography for quantum technology 2.0 research within the BMBF funded SuperLSI project.
THE TASK AT HEIDELBERG INSTRUMENTS: Development of a suitable, cost-effective lithography system to write structures below 200 nm: the DUV (deep ultra-violet) demonstrator.
THE DUV DEMONSTRATOR: A new lithography system, including an advanced spatial light modulator, a new laser at 266 nm wavelength, and completely redesigned optics. Design and construction phases finished, application and installation starting in September 2024.
MASTER PROJECT: Direct-write DUV lithography for research in quantum technology.
PROJECT ACTIVITIES: Joining the team at Heidelberg Instruments for setup, calibration and characterization of the DUV demonstrator. Following the delivery to KIP/Uni HD, integration of the new tool into the research workflow of AG Enss.
SCIENTIFIC FOCUS: Validation of the DUV direct-write system as a viable alternative to e-beam lithography for a R&D facility.
